NIOBIUM ROUND TARGET

NIOBIUM ROUND TARGET
Niobium targets are used in various high-tech applications, primarily in the field of thin film deposition processes such as sputtering or physical vapor deposition (PVD). Niobium, like tantalum, is known for its unique set of properties, including high melting point, corrosion resistance, and excellent conductivity.

Specification of Niobium Round Target
Products Size（mm） Grade Nos Specification
Niobium & Niobium Slab （1~2.5）×（8~300）×L R04200, R04210 ASTM B393
（2.5~6）×（20~1000）×L
（6~20）×（20~1000）×L

Advantages of Niobium Round Target
Niobium sputtering targets provide exceptional advantages: high purity ensures superior thin film quality, outstanding corrosion resistance guarantees longevity in harsh environments, and low thermal expansion minimizes stress during deposition. Their compatibility with various coating techniques makes them ideal for semiconductor, optical, and superconductive applications.