Basic MOS device physics

창공·2022년 6월 29일
0

전자회로

목록 보기
1/2
post-thumbnail

IDI_D (drain current)

IDI_D of NMOS (PMOS는 절댓값)

  • channel 형성 : VGS>VthV_{GS} > V_{th}
  • triode(linear) region : VDS<(VGSVth)V_{DS} < (V_{GS}-V_{th})
    • ID=μnCoxWL[(VGSVTH)VDS12VDS2]I_{D}=\mu_{n} C_{o x} \frac{W}{L}\left[\left(V_{G S}-V_{T H}\right) V_{D S}-\frac{1}{2} V_{D S}^{2}\right]
  • saturation region : VDS>(VGSVth)V_{DS} > (V_{GS}-V_{th})
    • ID,max=12μnCoxWL(VGSVTH)2I_{D, \max }=\frac{1}{2} \mu_{n} C_{o x} \frac{W}{L}\left(V_{G S}-V_{T H}\right)^{2}
  • overdrive voltage (유효 전압) : VGSVthV_{GS}-V_{th}

gmg_m (Transconductance)

MOS 소자가 전압을 전류로 얼마나 잘 변환하는가.

  • gm=IDVGSVDS, const. g_{m}=\left.\frac{\partial I_{D}}{\partial V_{G S}}\right|_{V D S, \text { const. }}

  • gm=μnCoxWL(VGSVTH)g_m = \mu_{n} C_{o x} \frac{W}{L}\left(V_{G S}-V_{T H}\right)

  • gm=2μnCoxWLIDg_{m}=\sqrt{2 \mu_{n} C_{o x} \frac{W}{L} I_{D}}

  • gm=2IDVGSVTHg_m = \frac{2 I_{D}}{V_{G S}-V_{T H}}

0개의 댓글